Mackenzie Pearson


How to optimize sample plating to run Echo MS system in ‘Fast acquisition mode’

The Echo MS system can acquire data extremely rapidly, at 1 second per sample. To achieve this speed, it should be ensured that there is adequate time between ejections for the analyte signal to return to baseline between ejections.

Plating your samples such that you are monitoring different analytes from adjacent wells, as shown below, can allow you to run up to 3 samples per second. This sample organization permits you to take advantage of the highest throughput of the Echo MS system, without needing to consider peak separation between adjacent samples, as they will not be directly compared. The acoustic ejection (AE) method can then be optimized to achieve baseline separation between consecutive peaks of the same component, in this case, between every fourth well.

Note: By default, the system runs a serpentine ejection pattern. Therefore, your samples must be plated accordingly. Adjacent wells cannot contain the same analytes or the peaks will not be baseline resolved.

Below, you can see that with the right sample plating and different components analyzed in different wells, we can analyze 3 different analytes with baseline resolution in fast mode!



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